{"product_id":"directed-selfassembly-of-block-copolymer","title":"Directed Selfassembly Of Block Copolymer By Gronheid, Roel","description":"The directed self-assembly (DSA) method of patterning for microelectronics uses polymer phase-separation to generate features of less than 20nm, with the positions of self-assembling materials externally guided into the desired pattern. Directed self-assembly of Block Co-polymers for Nano-manufacturing reviews the design, production, applications and future developments needed to facilitate the widescale adoption of this promising technology.     Beginning with a solid overview of the physics and chemistry of block copolymer (BCP) materials, Part 1 covers the synthesis of new materials and new processing methods for DSA. Part 2 then goes on to outline the key modelling and characterization principles of DSA, reviewing templates and patterning using topographical and chemically modified surfaces, line edge roughness and dimensional control, x-ray scattering for characterization, and nanoscale driven assembly. Finally, Part 3 discusses application areas and related issues for DSA in nano-manufacturing, including for basic logic circuit design, the inverse DSA problem, design decomposition and the modelling and analysis of large scale, template self-assembly manufacturing techniques.","brand":"MediaPlace","offers":[{"title":"Default Title","offer_id":57749234418046,"sku":"NW9780081002506","price":128.1,"currency_code":"GBP","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0817\/1379\/1261\/files\/9780081002506.jpg?v=1785063306","url":"https:\/\/mediaplace.com\/products\/directed-selfassembly-of-block-copolymer","provider":"MediaPlace","version":"1.0","type":"link"}